Cov txheej txheem txheej txheem rau PCB yog dab tsi?

The electroplating process of Circuit Court board tuaj yeem faib ua ntu zus rau hauv cov kua qaub ci tooj liab electroplating, electroplated nickel / kub thiab electroplated tin.

Plating Kab

1、 Classification of electroplating process:

Acid ci tooj liab electroplating npib tsib xee / kub electroplating tin

2, Txheej txheem ntws:

Pickling → tooj liab plating ntawm tag nrho pawg thawj coj saib → qauv hloov pauv → acid degreasing → theem nrab kev sib tw yaug → micro etching → theem nrab → pickling → tin plating → Secondary countercurrent yaug

Countercurrent rinsing → acid dipping → graphic copper plating → secondary countercurrent rinsing → nickel plating → secondary water washing → citric acid dipping → gold plating → recovery → 2-3-stage pure water washing → drying

3, Txheej txheem piav qhia:

(1) Pickling

Ole Lub luag haujlwm thiab lub hom phiaj:

Tshem cov oxide ntawm lub phaj nto thiab qhib lub phaj nto. Feem ntau, qhov siab yog 5%, thiab qee qhov raug tswj hwm txog 10%, feem ntau yog txhawm rau tiv thaiv cov dej los ntawm kev nkag mus thiab ua rau cov ntsiab lus sulfuric acid tsis ruaj khov hauv cov kua ua kua;

② The acid leaching time should not be too long to prevent oxidation of the plate surface; After use for a period of time, if the acid solution is turbid or the copper content is too high, it shall be replaced in time to prevent contamination of the plated copper cylinder and plate surface;

③ CP qib sulfuric acid yuav tsum siv ntawm no;

（2） Full plate copper plating: also known as primary copper, plate electricity, panel plating ① function and purpose:

Tiv thaiv cov tshuaj lom tooj liab tsuas yog tso, tiv thaiv cov tshuaj tooj liab los ntawm cov kua qaub tom qab oxidation, thiab ntxiv rau qee qhov los ntawm electroplating

② Cov txheej txheem tsis cuam tshuam nrog tooj liab plating ntawm tag nrho cov phaj: kev daws teeb meem da dej yog tsim los ntawm tooj liab sulfate thiab sulfuric acid. Cov mis ntawm cov kua qaub thiab tooj liab tsawg tau txais los ua kom ntseeg tau qhov sib npaug ntawm cov phaj tuab faib thiab sib sib zog nqus plating muaj peev xwm rau qhov sib sib zog nqus thaum lub tshuab electroplating; Cov ntsiab lus sulfuric feem ntau yog 180 g / L, thiab lawv feem ntau ncav cuag 240 g / L; Cov ntsiab lus ntawm tooj liab sulfate feem ntau yog li ntawm 75 g / L. Cov nyiaj ntxiv lossis lub tog raj kheej qhib tus nqi ntawm tooj liab txhuam feem ntau yog 3-5ml / L. Tam sim no ntawm tag nrho cov phaj electroplating feem ntau suav los ntawm kev sib npaug 2 A / square decimeter los ntawm thaj tsam electroplating ntawm phaj. Rau tag nrho cov phaj, nws yog phaj ntev DM × Phaj dav DM × ob × 2A/ DM2 ； Qhov kub ntawm lub tog raj kheej tooj liab tau tswj nyob hauv chav sov, feem ntau tsis tshaj 32 degrees, feem ntau tswj tau ntawm 22 degrees. Yog li ntawd, vim yog qhov kub nyob hauv lub caij ntuj sov, nws raug nquahu kom nruab qhov ntsuas cua txias rau lub tog raj kheej tooj liab;

③ Kev saib xyuas txheej txheem:

Ua kom tiav tooj liab txhuam hauv lub sijhawm raws li kiloampere teev txhua hnub, thiab ntxiv nws raws li 100-150ml / Kah; Txheeb xyuas seb lub twj tso kua mis ua haujlwm ib txwm muaj thiab puas muaj cua nkag los; Ntxuav cov pas nrig coj los txhuam nrog cov ntaub ntub dej huv txhua 2-3 teev; Cov ntsiab lus ntawm tooj liab sulfate (ib hlis ib zaug), sulfuric acid (ib zaug ib lub lim tiam) thiab chloride ion (ob zaug hauv ib lub lis piam) hauv lub tog raj kheej tooj liab yuav tsum tau tshuaj xyuas tas li txhua lub lim tiam, cov ntsiab lus ntawm qhov ci ntsa iab yuav tsum raug kho los ntawm Hall cell kuaj, thiab cov khoom siv raw yuav cuam tshuam nrog lub sijhawm; Ntxuav cov anode coj tus pas nrig thiab cov khoom siv txuas hluav taws xob ntawm ob qho kawg ntawm lub tank txhua lub lim tiam, ntxiv cov pob tooj liab anode hauv pob tawb titanium hauv lub sijhawm, thiab electrolyze nrog qhov qis tam sim no 0.2-0.5 ASD rau 6-8 teev; Txheeb xyuas seb lub pob tawb pob tawb titanium ntawm anode puas ntsoog txhua lub hlis, thiab hloov nws lub sijhawm; Txheeb xyuas seb av av av av tau sau rau hauv qab ntawm pob tawb anode titanium, thiab ntxuav nws raws sijhawm yog tias muaj; Cov pa roj carbon tau siv rau kev lim dej tas mus li rau 6-8 teev, thiab cov khoom tsis huv raug tshem tawm los ntawm cov hluav taws xob qis tam sim no tib lub sijhawm; Txhua txhua ib nrab xyoo lossis ntau dua, txiav txim siab seb puas muaj kev kho mob loj (ua kom cov hmoov carbon) raws li lub tank tso pa phem; Hloov cov lim lim ntawm lub twj tso kua lim txhua ob lub lis piam;

Procedure Cov txheej txheem kho mob loj: A. tshem tawm cov anode, nchuav cov anode, ntxuav cov yeeb yaj kiab anode ntawm qhov chaw anode, thiab tom qab ntawd muab tso rau hauv lub thoob ntim cov tooj liab anode. Roughen tus tooj liab saum npoo kom zoo ib yam paj yeeb nrog micro etchant. Tom qab ntxuav thiab ziab, muab tso rau hauv lub pob tawb titanium thiab muab tso rau hauv lub tank kua qaub rau kev tos. B. tsau anode titanium pob tawb thiab hnab anode hauv 10% alkaline tov rau 6-8 teev, ntxuav thiab qhuav nrog dej, thiab tom qab ntawd tsau hauv 5% dilute sulfuric acid, Ntxuav thiab qhuav nrog dej rau tos; C. Hloov lub tank tso kua rau hauv lub tank tos, ntxiv 1-3ml / L 30% hydrogen peroxide, pib ua cua sov, tig cua rau thaum kub txog 65 ℃, thiab ua kom cua txias rau 2-4 teev; D. Tua tawm huab cua nplawm, maj mam ua kom cov hmoov ua hmoov nkag rau hauv cov kua tov ntawm tus nqi ntawm 3-5g / L, tig rau huab cua nplawm tom qab kev ua tiav tiav, thiab ua kom sov li 2-4 teev; E. Tua cov cua ua kom sov, ua kom sov thiab cia cov pa roj carbon activated ua rau hauv qab ntawm lub tank maj mam; F. Thaum qhov ntsuas kub poob qis txog 40 ℃, siv 10um PP lub lim lim thiab lim cov hmoov pab txhawm rau lim lub tank kua mus rau hauv lub tank ua haujlwm huv, tig rau huab cua sib tov, tso lub anode, dai nws rau hauv cov phaj electrolytic, thiab electrolyze ntawm tsawg tam sim no raws li 0.2-0.5asd ntom tam sim no rau 6-8 teev. G. kho cov ntsiab lus ntawm sulfuric acid, tooj liab sulfate thiab chloride ion hauv lub tank mus rau qhov kev ua haujlwm ib txwm tom qab kuaj sim; Ua kom tiav lub ci ntsa iab raws li qhov ntsuas ntawm Hall ntawm tes; H. Tom qab cov xim ntawm lub phaj yog qhov sib xws, cov hluav taws xob tuaj yeem tso tseg, thiab tom qab ntawd cov yeeb yaj kiab electrolytic raug kho rau 1-2 teev raws li qhov ntom tam sim no ntawm 1-1.5asd. Ib txheej ntawm cov xim dub phosphorus zaj duab xis nrog cov nplaum ntom ntom tau tsim ntawm cov anode; 1. Xeem plating OK;

⑤ The anode copper ball contains 0.3-0.6% phosphorus. The main purpose is to reduce the anode dissolution efficiency and reduce the production of copper powder;

⑥ When replenishing drugs, if the amount is large, such as copper sulfate and sulfuric acid; Low current electrolysis shall be conducted after addition; Pay attention to safety when adding sulfuric acid. When the amount of sulfuric acid is large (more than 10 liters), add it slowly several times; Otherwise, the temperature of the bath liquid will be too high, the photocatalyst decomposition will be accelerated, and the bath liquid will be polluted;

Attention Kev saib xyuas tshwj xeeb yuav tsum tau them rau qhov ntxiv ntawm chloride ion, vim tias cov ntsiab lus chloride ion tshwj xeeb yog qis (30-90ppm), nws yuav tsum tau ntsuas kom raug nrog lub tog raj kheej ntsuas lossis ntsuas khob ua ntej ntxiv; 1ml hydrochloric acid muaj txog 385ppm chloride ion,

Formula Tshuaj ntxiv cov lej suav:

Copper sulfate (kg) = (75-x) × Tank volume (L) / 1000

Sulfuric acid (in liters) = (10% – x) g / L × Tank volume (L)

Or (in liters) = (180-x) g / L × Tank volume (L) / 1840

Hydrochloric acid (ML) = (60-x) ppm × Tank volume (L) / 385

(3) Acid degreasing

① Lub hom phiaj thiab kev ua haujlwm: tshem tawm cov oxide ntawm cov tooj liab ntawm kab, cov yeeb yaj kiab ntawm cov kua nplaum thiab cov kua nplaum uas seem, thiab xyuas kom cov nplaum ntawm thawj tooj liab thiab qauv electroplating tooj liab lossis npib tsib xee

② Remember to use acid degreaser here. Why not use alkaline degreaser, and the degreasing effect of alkaline degreaser is better than that of acid degreaser? Mainly because the graphic ink is not alkali resistant and will damage the graphic circuit, only acidic degreaser can be used before graphic electroplating.

③ Thaum tsim khoom, nws tsuas yog tsim nyog los tswj lub siab thiab lub sijhawm ntawm degreaser. Cov concentration ntawm degreaser yog li 10% thiab lub sijhawm tau lees tias yog 6 feeb. Lub sijhawm ntev me ntsis yuav tsis muaj kev phom sij; Kev siv thiab hloov pauv cov kua ua kua kuj tseem ua raws li 15 m2 / L ua haujlwm ua kua, thiab cov tshuaj ntxiv yog ua raws 100 m2 0. 5 – 0。 8L ；

（4） Micro etching:

Eatching Kab

Pose Lub hom phiaj thiab kev ua haujlwm: ntxuav thiab roughen tooj liab saum npoo ntawm Circuit Court kom ntseeg tau tias muaj kev sib zog ntawm cov qauv tooj liab thiab tooj tooj liab

② Sodium persulfate feem ntau yog siv los ua micro etchant, nrog kev ruaj khov thiab zoo sib xws tus nqi thiab dej huv tau zoo. Cov concentration ntawm sodium persulfate feem ntau yog tswj ntawm kwv yees li 60 g / L thiab lub sijhawm raug tswj ntawm li 20 vib nas this. Ntxiv cov tshuaj yog 3-4 kg rau 100 square metres; Cov ntsiab lus tooj liab yuav tsum tau tswj qis dua 20 g / L; Lwm yam kev saib xyuas thiab hloov lub tog raj kheej yog tib yam li tooj liab nag lossis daus micro corrosion.

(5) Pickling

Ole Lub luag haujlwm thiab lub hom phiaj:

Tshem cov oxide ntawm lub phaj nto thiab qhib lub phaj nto. Feem ntau, qhov siab yog 5%, thiab qee qhov raug tswj hwm txog 10%, feem ntau yog txhawm rau tiv thaiv cov dej los ntawm kev nkag mus thiab ua rau cov ntsiab lus sulfuric acid tsis ruaj khov hauv cov kua ua kua;

② The acid leaching time should not be too long to prevent oxidation of the plate surface; After use for a period of time, if the acid solution is turbid or the copper content is too high, it shall be replaced in time to prevent contamination of the plated copper cylinder and plate surface;

③ CP qib sulfuric acid yuav tsum siv ntawm no;

（6） Graphic copper plating: also known as secondary copper, circuit copper plating

① Lub hom phiaj thiab kev ua haujlwm: txhawm rau ua kom tau raws li qhov ntsuas tam sim no ntawm txhua kab, txhua kab thiab qhov tooj liab xav tau kom mus txog qhov tuab. Rau lub hom phiaj ntawm kab tooj liab plating, lub qhov tooj liab thiab kab tooj liab yuav tsum ua kom tuab rau qee qhov tuab hauv lub sijhawm;

② Lwm yam khoom yog tib yam li cov phaj phaj plating

（7） Electroplated tin ① purpose and function: the purpose of graphic electroplated pure tin mainly uses pure tin as a metal resist layer to protect circuit etching;

② Cov dej da dej feem ntau yog tsim los ntawm stannous sulfate, sulfuric acid thiab tshuaj ntxiv; Stannous sulfate cov ntsiab lus yog tswj ntawm kwv yees li 35 g / L thiab sulfuric acid tau tswj ntawm li 10%; Qhov ntxiv ntawm tin plating additives feem ntau yog ntxiv raws li cov txheej txheem ntawm kiloampere teev lossis raws li qhov ua tau zoo tiag tiag; Tam sim no cov electroplated tin feem ntau yog xam raws li 1. 5 A / square decimeter sib npaug los ntawm thaj tsam electroplating ntawm phaj; Qhov kub ntawm lub tog raj kheej tin yog tswj hwm ntawm chav sov. Feem ntau, qhov kub tsis tshaj 30 degrees thiab feem ntau tswj tau ntawm 22 degrees. Yog li ntawd, vim qhov kub nyob hauv lub caij ntuj sov, nws raug nquahu kom nruab lub tshuab txias thiab ntsuas kub rau lub tog raj kheej tin;

③ Kev saib xyuas txheej txheem:

Ncua sij hawm ntxiv tin plating additives raws li kiloampere teev txhua hnub; Txheeb xyuas seb lub twj tso kua mis ua haujlwm ib txwm muaj thiab puas muaj cua nkag los; Ntxuav cov pas nrig coj los txhuam nrog cov ntaub ntub ntub txhua 2-3 teev; Txheeb xyuas stannous sulfate (ib zaug ib lub lim tiam) thiab sulfuric acid (ib hlis ib zaug) hauv cov thooj voos kheej kheej tsis tu ncua txhua lub lim tiam, kho cov ntsiab lus ntawm tin plating cov tshuaj ntxiv los ntawm Hall cell kuaj, thiab ntxiv cov khoom siv raw li lub sijhawm; Ntxuav cov pas nrig anode thiab cov txuas hluav taws xob ntawm ob qho kawg ntawm lub tank txhua lub lim tiam; Kev ntsuas hluav taws xob nrog qhov qis tam sim no 0.2-0.5 ASD rau 6-8 teev hauv ib lub lis piam; Lub hnab anode yuav tsum tau tshuaj xyuas txhua lub hlis rau kev puas tsuaj, thiab ib qho puas yuav raug hloov pauv raws sijhawm; Txheeb xyuas seb puas muaj av av av av nyob hauv qab ntawm lub hnab anode, thiab ntxuav nws kom raws sijhawm yog tias muaj; Lim tsis tu ncua nrog cov pa roj carbon rau 6-8 teev nyob rau ib hlis, thiab tshem tawm cov impurities los ntawm cov hluav taws xob qis tam sim no; Txhua txhua ib nrab xyoo lossis ntau dua, txiav txim siab seb puas muaj kev kho mob loj (ua kom cov hmoov carbon) raws li lub tank tso pa phem; Hloov cov lim lim ntawm lub twj tso kua lim txhua ob lub lis piam;

Procedure Cov txheej txheem kho mob loj: A. tshem tawm cov anode, tshem lub hnab anode, ntxuav qhov anode nto nrog txhuam tooj liab, ntxuav thiab qhuav nws nrog dej, muab tso rau hauv lub hnab anode thiab muab tso rau hauv cov kua qaub rau tos. B. tsau lub hnab anode hauv 10% alkaline tov rau 6-8 teev, ntxuav thiab qhuav nws nrog dej, tsau nws hauv 5% dilute sulfuric acid, thiab ntxuav thiab qhuav nws nrog dej rau tos; C. Hloov cov cell daws mus rau lub xovtooj ntawm tes thiab maj mam yaj cov pa roj carbon activated mus rau hauv cov cell daws ntawm tus nqi ntawm 3-5g / L. nrog 4um PP lim keeb thiab lim cov hmoov pab rau lub cell ua haujlwm huv, muab tso rau hauv qhov anode, dai nws rau hauv cov phaj electrolytic, thiab electrolyze ntawm qhov qis tam sim no ntawm 6-10asd tam sim no ceev rau 0.2-0.5 teev. D. kho cov tshuaj sulfuric acid hauv xovtooj ntawm tes tomqab tshuaj tshuaj, Cov ntsiab lus Stannous sulfate nyob rau hauv ib txwm ua haujlwm ntau; Ntxiv tin plating additives raws li Hall ntawm tes kuaj cov txiaj ntsig; E. Nres cov tshuaj electrolysis tom qab cov xim ntawm cov phaj electrolytic tau zoo ib yam; F. Test plating OK;

④ Thaum ntxiv cov tshuaj ntxiv, yog tias cov nyiaj ntxiv tau loj, xws li stannous sulfate thiab sulfuric acid; Kev ntsuas hluav taws xob tsawg tam sim no yuav tsum tau ua tom qab ntxiv; Ua tib zoo saib xyuas kev nyab xeeb thaum ntxiv cov tshuaj sulfuric acid. Thaum cov tshuaj sulfuric acid loj (ntau dua 10 litres), ntxiv nws maj mam ob peb zaug; Txwv tsis pub, qhov kub da dej yuav siab dhau, cov tin oxide yuav oxidized, thiab kev laus ntawm cov kua yuav nrawm dua.

Formula Tshuaj ntxiv cov lej suav:

Stannous sulfate (unit: kg) = (40-x) × Tank ntim (L) / 1000

Sulfuric acid (in liters) = (10% – x) g / L × Tank volume (L)

Or (in liters) = (180-x) g / L × Tank volume (L) / 1840

(9) Nickel plating

① Lub hom phiaj thiab kev ua haujlwm: txheej txheej npib tsib xee feem ntau yog siv los ua txheej txheej txheej ntawm txheej tooj liab thiab txheej kub kom tiv thaiv kev sib kis ntawm cov kub thiab tooj liab thiab cuam tshuam rau kev txuas thiab kev pab lub neej ntawm pawg thawj coj saib; Nyob rau tib lub sijhawm, thaub qab ntawm npib tsib xee txheej kuj zoo heev ua rau lub zog ntawm cov txheej kub;

② Cov txheej txheem tsis cuam tshuam nrog tooj liab plating ntawm tag nrho cov phaj: qhov sib ntxiv ntawm npib tsib xee plating ntxiv yog feem ntau ntxiv raws li cov txheej txheem ntawm kiloampere teev, lossis qhov nyiaj ntxiv yog kwv yees li 200ml / Kah raws li qhov ua tau zoo ntawm cov phaj; Tam sim no ntawm cov qauv electroless nickel plating feem ntau suav los ntawm kev sib npaug 2 A / square decimeter los ntawm thaj chaw electroplating ntawm phaj; Qhov kub ntawm npib tsib xee npib tsib xee yog tswj tau ntawm 40-55 degrees, thiab qhov kub thiab txias yog li 50 degrees. Yog li ntawd, lub tog raj kheej npib tsib xee yuav tsum tau nruab nrog cua sov thiab tswj qhov kub thiab txias;

③ Kev saib xyuas txheej txheem:

Ncua sij hawm ntxiv npib tsib xee plating ntxiv raws li kiloampere teev txhua hnub; Txheeb xyuas seb lub twj tso kua mis ua haujlwm ib txwm muaj thiab puas muaj cua nkag los; Ntxuav cov pas nrig coj los txhuam nrog cov ntaub ntub ntub txhua 2-3 teev; Txheeb xyuas cov ntsiab lus ntawm npib tsib xee sulfate (npib tsib xee sulfamate) (ib hlis ib zaug), npib tsib xee chloride (ib zaug ib lub lim tiam) thiab boric acid (ib hlis ib zaug) hauv lub tog raj kheej tooj liab tsis tu ncua txhua lub lim tiam, kho cov ntsiab lus ntawm npib tsib xee plating ntxiv los ntawm Hall cell kuaj , thiab ntxiv cov khoom tseem ceeb cuam tshuam rau lub sijhawm; Ntxuav cov anode coj tus pas nrig thiab cov khoom siv txuas hluav taws xob ntawm ob qho kawg ntawm lub tank txhua lub lim tiam, ntxiv rau lub kaum sab xis anode nickel hauv lub pob tawb titanium hauv lub sijhawm, thiab electrolyze nrog tam sim no qis 0.2-0.5 ASD rau 6-8 teev; Txheeb xyuas seb lub pob tawb pob tawb titanium ntawm anode puas ntsoog txhua lub hlis, thiab hloov nws lub sijhawm; Txheeb xyuas seb av av av av tau sau rau hauv qab ntawm pob tawb anode titanium, thiab ntxuav nws raws sijhawm yog tias muaj; Cov pa roj carbon tau siv rau kev lim dej tas mus li rau 6-8 teev, thiab cov khoom tsis huv raug tshem tawm los ntawm cov hluav taws xob qis tam sim no tib lub sijhawm; Txhua txhua ib nrab xyoo lossis ntau dua, txiav txim siab seb puas muaj kev kho mob loj (ua kom cov hmoov carbon) raws li lub tank tso pa phem; Hloov cov lim lim ntawm lub twj tso kua lim txhua ob lub lis piam;

Procedure Cov txheej txheem kho mob loj: A. tshem tawm cov anode, nchuav cov anode, ntxuav cov anode, thiab tom qab ntawd muab tso rau hauv lub thoob ntim nrog cov xaum npib tsib xee, roughen saum npoo ntawm npib tsib xee kaum nrog micro etchant rau xim liab. Tom qab ntxuav thiab ziab, muab tso rau hauv lub pob tawb titanium thiab muab tso rau hauv lub tank kua qaub rau kev tos. B. tsau anode titanium pob tawb thiab lub hnab anode hauv 10% alkaline tov rau 6-8 teev, ntxuav thiab qhuav nrog dej, thiab tom qab ntawd tsau hauv 5% dilute sulfuric acid, Ntxuav thiab qhuav nrog dej rau tos; C. Hloov lub tank tso kua rau hauv lub tank tos, ntxiv 1-3ml / L 30% hydrogen peroxide, pib ua cua sov, tig cua rau thaum kub txog 65 ℃, thiab ua kom cua txias rau 2-4 teev; D. Tua tawm huab cua nplawm, maj mam ua kom cov hmoov ua hmoov nkag rau hauv cov kua tov ntawm tus nqi ntawm 3-5g / L, tig rau huab cua nplawm tom qab kev ua tiav tiav, thiab ua kom sov li 2-4 teev; E. Tua cov cua ua kom sov, ua kom sov thiab cia cov pa roj carbon activated ua rau hauv qab ntawm lub tank maj mam; F. Thaum qhov ntsuas kub poob qis txog 40 ℃, siv 10um PP lub lim lim thiab lim cov hmoov pab txhawm rau lim lub tank kua mus rau hauv lub tank ua haujlwm huv, tig rau huab cua sib tov, muab tso rau hauv anode, dai nws rau hauv cov phaj electrolytic, thiab nias 0. 2-0。 5asd qhov ntom ntom ntom tam sim hluav taws xob qis rau 6-8 teev, G. tom qab tshuaj xyuas tshuaj, kho cov ntsiab lus ntawm npib tsib xee sulfate lossis npib tsib xee sulfamate, npib tsib xee chloride thiab boric acid hauv lub tank mus rau qhov ua haujlwm ib txwm muaj; Ntxiv cov npib tsib xee plating ntxiv raws li qhov ntsuas ntawm Hall ntawm tes; H. Tom qab cov xim ntawm cov phaj electrolytic tau zoo ib yam, nres electrolysis, thiab tom qab ntawd ua kev kho hluav taws xob raws li qhov ntom tam sim no ntawm 1-1.5 ASD rau 10-20 feeb los qhib lub anode; 1. Xeem plating OK;

⑤ Thaum ntxiv cov tshuaj, yog tias qhov nyiaj ntxiv tau loj, xws li nickel sulfate lossis nickel sulfamate thiab nickel chloride, nws yuav tsum tau electrolyzed nrog cov dej tam sim no tom qab ntxiv; Thaum ntxiv boric acid, muab cov kua boric ntxiv rau hauv lub hnab ntim anode huv si thiab dai nws hauv lub tog raj kheej npib tsib xee. Nws tsis tuaj yeem ncaj qha ntxiv rau hauv lub tank;

⑥ Tom qab npib tsib xee plating, nws raug nquahu kom ntxiv cov dej rov los ntxuav thiab qhib lub tog raj kheej nrog cov dej ntshiab, uas tuaj yeem siv los ntxiv cov qib kua ua kom sov los ntawm cua sov hauv lub tog raj kheej npib tsib xee. Tom qab ntxuav dej rov qab, nws txuas nrog lwm qhov kev tiv thaiv tam sim no;

Formula Tshuaj ntxiv cov lej suav:

Nickel sulfate (kg) = (280-x) × Tank ntim (L) / 1000

Nickel chloride (kg) = (45-x) × Tank ntim (L) / 1000

Boric acid (kg) = (45-x) × Tank ntim (L) / 1000

（10） Electroplating kub: nws tau muab faib ua cov txheej txheem kub plating (kub kub) thiab dej kub (kub ntshiab). Cov muaj pes tsawg leeg ntawm cov tawv tawv tawv yog qhov zoo ib yam li ntawm cov mos mos da dej kub, tab sis muaj qee cov cim hlau xws li npib tsib xee, cobalt lossis hlau hauv qhov kub kub da dej;

Pose Lub hom phiaj thiab kev ua haujlwm: raws li cov hlau muaj txiaj ntsig, kub muaj kev sib txuas tau zoo, tiv taus oxidation, tiv taus xeb, tiv taus tiv taus tsawg thiab hnav tsis kam